IP Library › Assignment 027025/0296
Patent Assignment
Reel/Frame 027025/0296

Assignment of Assignor's Interest

Recorded: 2011-10-06 Pages: 6
Assignors
AKATSU, TAKESHI
Executed: 2006-06-22
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Properties (2)
Method of Fabricating a Release Substrate
Patent: 8,012,289 →
Application: 12/392,888 →
Publication: US 2009/0179299
Method of Fabricating a Release Substrate
Application: 13/151,358 →
Publication: US 2011/0233733
Related Assignments (1)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →