IP Library › Assignment 027064/0192
Patent Assignment
Reel/Frame 027064/0192

Assignment of Assignor's Interest

Recorded: 2011-10-14 Pages: 4
Assignors
WANN, CLEMENT HSINGJEN
Executed: 2011-10-05
YEH, LING-YEN
Executed: 2011-10-05
SHIH, CHI-YUAN
Executed: 2011-10-12
LIN, YI-TANG
Executed: 2011-10-11
CHANG, CHIH-SHENG
Executed: 2011-10-11
LIU, CHI-WEN
Executed: 2011-10-13
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. VI, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
Selective Fin-Shaping Process Using Plasma Doping and Etching for 3-Dimensional Transistor Applications
Patent: 8,946,829 →
Application: 13/273,527 →
Publication: US 2013/0093026
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 5, 2024
From: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
To: PARABELLUM STRATEGIC OPPORTUNITIES FUND LLC
Reel/Frame 068326/0474 →