Assignment of Assignor's Interest

Recorded: 2012-02-16 Pages: 3

Assignor

LEE, SANG IN

Executed: 2012-02-15

Assignee

SYNOS TECHNOLOGY, INC.

568 E. WEDDELL DRIVE, SUITE #8, SUNNYVALE, CALIFORNIA, 94089

Covered Property (1)

Atomic Layer Deposition Using Radicals of Gas Mixture

Patent: 8,877,300 →

Application: 13/369,717 →

Publication: US 2012/0207948

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.