Patent Assignment
Reel/Frame 027763/0667
Assignment of Assignor's Interest
Recorded: 2012-02-26
Pages: 3
Assignor
KENNARD, MARK
Executed: 2012-01-03
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Property
(1)
Method for Manufacturing a Heterostructure Aiming at Reducing the Tensile Stress Condition of a Donor Substrate
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.