Assignment of Assignor's Interest

Recorded: 2012-04-09 Pages: 4

Assignor

BYUN, CHUL SOO

Executed: 2012-03-29

Assignees

PIEZONICS CO., LTD.

35-3, HONGCHEON-RI, IPJANG-MYEON, SEOBUK-GU, CHEONAN-SI, CHUNGCHEONGNAM-DO, 331-825, KOREA, REPUBLIC OF

35-3, HONGCHEON-RI, IPJANG-MYEON, SEOBUK-GU, CHEONAN-SI, CHUNGCHEONGNAM-DO, 331-825, KOREA, REPUBLIC OF

Covered Properties (3)

Method and Apparatus for Chemical Vapor Deposition Capable of Preventing Contamination and Enhancing Film Growth Rate

Patent: 7,156,921 →

Application: 10/267,208 →

Publication: US 2003/0077388

Method for Chemical Vapor Deposition Capable of Preventing Contamination and Enhancing Film Growth Rate

Patent: 7,485,339 →

Application: 11/602,523 →

Publication: US 2007/0065599

Apparatus for Chemical Vapor Deposition (Cvd) with Showerhead

Patent: 8,298,370 →

Application: 12/351,540 →

Publication: US 2009/0178616

Related Assignments (1)

Other recorded transfers of the patents in this record — the chain of ownership.