IP Library Assignment 028060/0291
Patent Assignment
Reel/Frame 028060/0291

Assignment of Assignor's Interest

Recorded: 2012-04-17 Pages: 2
Assignors
ONO, HIROSHI
Executed: 2011-07-07
SHINODA, TAKASHI
Executed: 2011-07-07
OKADA, YUUHEI
Executed: 2011-07-13
Assignee
HITACHI CHEMICAL COMPANY, LTD.
1-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property (1)
Polishing Agent for Copper Polishing and Polishing Method Using Same
Patent: 8,859,429 →
Application: 13/412,893 →
Publication: US 2012/0160804
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Aug 15, 2014
From: HITACHI CHEMICAL COMPANY, LTD.
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 033549/0805 →
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →