IP Library Assignment 028063/0545
Patent Assignment
Reel/Frame 028063/0545

Assignment of Assignor's Interest

Recorded: 2012-04-18 Pages: 2
Assignors
KAWANAMI, YOSHIMI
Executed: 2012-02-20
ISHITANI, TOHRU
Executed: 2012-02-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Gas Field Ionization Ion Source and Ion Beam Device
Patent: 8,809,801 →
Application: 13/501,561 →
Publication: US 2012/0199758
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →