IP Library › Assignment 028101/0524
Patent Assignment
Reel/Frame 028101/0524

Assignment of Assignor's Interest

Recorded: 2012-04-25 Pages: 4
Assignors
DE, HO WEI
Executed: 2012-02-10
LU, KUEI-LIANG
Executed: 2012-02-10
SHIEH, MING-FENG
Executed: 2012-02-10
CHANG, CHING-YU
Executed: 2012-02-10
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN ROAD 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Cut-Mask Patterning Process for Fin-Like Field Effect Transistor (Finfet) Device
Patent: 9,236,267 →
Application: 13/369,818 →
Publication: US 2013/0210232
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Assignment to Correct the 1ST Inventors Name to Wei-De Ho Previously Recorded on Reel 028101 Frame 0524. Assignor(S) Hereby Confirms the Assignment. Oct 10, 2017
From: HO, WEI-DE; LU, KUEI-LIANG; SHIEH, MING-FENG; CHANG, CHING-YU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 044170/0930 →