IP Library › Assignment 044170/0930
Patent Assignment
Reel/Frame 044170/0930

Corrective Assignment to Correct the 1ST Inventors Name to Wei-De Ho Previously Recorded on Reel 028101 Frame 0524. Assignor(S) Hereby Confirms the Assignment.

Recorded: 2017-10-10 Pages: 9
Assignors
HO, WEI-DE
Executed: 2017-10-03
LU, KUEI-LIANG
Executed: 2012-02-10
SHIEH, MING-FENG
Executed: 2012-02-10
CHANG, CHING-YU
Executed: 2012-02-10
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Cut-Mask Patterning Process for Fin-Like Field Effect Transistor (Finfet) Device
Patent: 9,236,267 →
Application: 13/369,818 →
Publication: US 2013/0210232
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 25, 2012
From: DE, HO WEI; LU, KUEI-LIANG; SHIEH, MING-FENG; CHANG, CHING-YU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 028101/0524 →