Patent Assignment
Reel/Frame 028842/0317
Assignment of Assignor's Interest
Recorded: 2012-08-24
Pages: 3
Assignors
ORITA, AKIHIRO
Executed: 2012-05-21
YOSHIDA, MASATO
Executed: 2012-05-21
NOJIRI, TAKESHI
Executed: 2012-05-28
MACHII, YOICHI
Executed: 2012-05-21
IWAMURO, MITSUNORI
Executed: 2012-05-28
ADACHI, SHUICHIRO
Executed: 2012-05-21
SATO, TETSUYA
Executed: 2012-05-21
TANAKA, TORU
Executed: 2012-05-21
Assignee
HITACHI CHEMICAL COMPANY, LTD.
1-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property
(1)
Material for Forming Passivation Film for Semiconductor Substrate, Passivation Film for Semiconductor Substrate and Method of Producing the Same, and Photovoltaic Cell Element and Method of Producing the Same
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →