IP Library Assignment 029338/0889
Patent Assignment
Reel/Frame 029338/0889

Assignment of Assignor's Interest

Recorded: 2012-11-21 Pages: 16
Assignors
YOSHIKAWA, HIROKI
Executed: 2012-10-30
INAZUKI, YUKIO
Executed: 2012-10-30
KOITABASHI, RYUJI
Executed: 2012-10-30
KANEKO, HIDEO
Executed: 2012-10-30
KOJIMA, YOSUKE
Executed: 2012-10-30
HARAGUCHI, TAKASHI
Executed: 2012-10-30
HIROSE, TOMOHITO
Executed: 2012-10-30
Assignees
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, 110-0016, JAPAN
Covered Property (1)
Light Pattern Exposure Method, Halftone Phase Shift Mask, and Halftone Phase Shift Mask Blank
Patent: 8,753,786 →
Application: 13/682,188 →
Publication: US 2013/0130159
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Company Split Sep 12, 2022
From: TOPPAN INC.
To: TOPPAN PHOTOMASK CO.,LTD.
Reel/Frame 061388/0555 →
Change of Name Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →