IP Library Assignment 029414/0001
Patent Assignment
Reel/Frame 029414/0001

Assignment of Assignor's Interest

Recorded: 2012-12-06 Pages: 8
Assignors
TANAKA, HIROMITSU
Executed: 2012-11-13
TAKANASHI, KAZUNORI
Executed: 2012-11-13
MINEGISHI, SHINYA
Executed: 2012-11-15
MORI, TAKASHI
Executed: 2012-11-13
SEKO, TOMOAKI
Executed: 2012-11-13
SUZUKI, JYUNYA
Executed: 2012-11-13
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property (1)
Method for Forming Resist Pattern, and Composition for Forming Resist Underlayer Film
Patent: 8,956,807 →
Application: 13/630,245 →
Publication: US 2013/0101942
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →