Patent Assignment
Reel/Frame 029564/0493
Correction of Correspondence Data
Recorded: 2013-01-02
Pages: 19
Assignors
YOSHIKAWA, HIROKI
Executed: 2012-10-30
INAZUKI, YUKIO
Executed: 2012-10-30
KOITABASHI, RYUJI
Executed: 2012-10-30
KANEKO, HIDEO
Executed: 2012-10-30
KOJIMA, YOSUKE
Executed: 2012-10-30
HARAGUCHI, TAKASHI
Executed: 2012-10-30
HIROSE, TOMOHITO
Executed: 2012-10-30
Assignees
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, 110-0016, JAPAN
Covered Property
(1)
Light Pattern Exposure Method, Photomask, and Photomask Blank
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Nov 21, 2012
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; KOITABASHI, RYUJI; KANEKO, HIDEO
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 029338/0511 →
Company Split
Sep 12, 2022
From: TOPPAN INC.
To: TOPPAN PHOTOMASK CO.,LTD.
Reel/Frame 061388/0555 →
Change of Name
Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →