IP Library › Assignment 029697/0241
Patent Assignment
Reel/Frame 029697/0241

Assignment of Assignor's Interest

Recorded: 2013-01-25 Pages: 2
Assignors
KANAZAWA, SHUNSUKE
Executed: 2012-12-13
YASUI, NAOKI
Executed: 2012-12-13
MORIMOTO, MICHIKAZU
Executed: 2012-12-13
OHGOSHI, YASUO
Executed: 2012-12-13
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,992,724 →
Application: 13/749,784 →
Publication: US 2014/0148016
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →