IP Library › Assignment 030126/0328
Patent Assignment
Reel/Frame 030126/0328

Assignment of Assignor's Interest

Recorded: 2013-04-01 Pages: 12
Assignors
LIAO, KUO-CHANG
Executed: 2008-07-04
SONG, WEIJUN
Executed: 2003-03-03
LIAO, DANG QUAN
Executed: 2002-07-05
Assignee
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANG JIANG RD., PUDONG NEW AREA, SHANGHAI, 201203, CHINA
Covered Property (1)
Method and Resulting Structure for Deep Trench Polysilicon Hard Mask Removal
Patent: 8,247,305 →
Application: 12/960,357 →
Publication: US 2012/0129314
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 3, 2013
From: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
To: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION; SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Reel/Frame 030146/0243 →