IP Library Assignment 030741/0327
Patent Assignment
Reel/Frame 030741/0327

Assignment of Assignor's Interest

Recorded: 2013-07-05 Pages: 9
Assignors
LI, YANGCHAO
Executed: 2013-06-03
GENG, BO
Executed: 2013-05-29
WU, XUEWEI
Executed: 2013-05-31
QIU, GUOQING
Executed: 2013-06-03
LIU, XU
Executed: 2013-05-28
Assignee
BEIJING NMC CO., LTD.
NO. 8 WENCHANG AVENUE, BEIJING ECONOMIC-TECHNOLOGICAL DEVLOPMENT AREA, BEIJING, 100176, CHINA
Covered Property (1)
Magnetron Source, Magnetron Sputtering Apparatus and Magnetron Sputtering Method
Patent: 9,399,817 →
Application: 13/977,314 →
Publication: US 2013/0277205
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 25, 2018
From: BEIJING NMC CO., LTD
To: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
Reel/Frame 046419/0493 →