Patent Assignment
Reel/Frame 046419/0493
Change of Name
Recorded: 2018-06-25
Pages: 5
Assignor
BEIJING NMC CO., LTD
Executed: 2017-01-03
Assignee
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
NO. 1 EAST JIUXIANQIAO ROAD, CHAOYANG DISTRICT, BEIJING, 100016, CHINA
Covered Properties
(7)
Device and Method for Controlling Dc Bias of Rf Discharge System
Plasma Processing Equipment and Gas Distribution Apparatus Thereof
Plasma Processing Apparatus
Plasma Processing Apparatus
Magnetron Source, Magnetron Sputtering Apparatus and Magnetron Sputtering Method
Plasma Processing Equipment and Gas Distribution Apparatus Thereof
Substrate Etching Method and Substrate Processing Device
Related Assignments
(6)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 4, 2010
From: ZHAO, YI
To: BEIJING NMC CO., LTD.
Reel/Frame 024490/0462 →
Assignment of Assignor's Interest
Jul 8, 2010
From: YAO, LIQIANG
To: BEIJING NMC CO., LTD.
Reel/Frame 024650/0725 →
Assignment of Assignor's Interest
Mar 15, 2011
From: ZHANG, FENGGANG
To: BEIJING NMC CO., LTD.
Reel/Frame 025962/0058 →
Assignment of Assignor's Interest
May 4, 2011
From: WEI, GANG
To: BEIJING NMC CO., LTD.
Reel/Frame 026234/0306 →
Assignment of Assignor's Interest
Jul 5, 2013
From: LI, YANGCHAO; GENG, BO; WU, XUEWEI; QIU, GUOQING
To: BEIJING NMC CO., LTD.
Reel/Frame 030741/0327 →
Assignment of Assignor's Interest
Jun 19, 2014
From: WEI, GANG; WANG, CHUN; LI, DONGSAN
To: BEIJING NMC CO., LTD.
Reel/Frame 033139/0251 →