IP Library Assignment 031997/0582
Patent Assignment
Reel/Frame 031997/0582

Change of Address of Assignee

Recorded: 2014-01-13 Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2013-01-01
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Photosensitive Conductive Film, Method for Forming Conductive Film, Method for Forming Conductive Pattern, and Conductive Film Substrate
Patent: 8,674,233 →
Application: 13/368,057 →
Publication: US 2012/0138348
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →