Patent Assignment
Reel/Frame 032197/0027
Assignment of Assignor's Interest
Recorded: 2014-02-11
Pages: 2
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Ion Beam Device Having Gas Introduction Port Disposed on Structure Maintained at Ground Potential
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.