IP Library › Assignment 032470/0360
Patent Assignment
Reel/Frame 032470/0360

Assignment of Assignor's Interest

Recorded: 2014-03-19 Pages: 2
Assignors
FUKUCHI, KOUSUKE
Executed: 2014-02-14
NAKAMOTO, SHIGERU
Executed: 2014-02-14
USUI, TATEHITO
Executed: 2014-02-20
INOUE, SATOMI
Executed: 2014-02-14
HIROTA, KOUSA
Executed: 2014-02-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 9,190,336 →
Application: 14/183,562 →
Publication: US 2015/0024521
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →