IP Library Assignment 032640/0856
Patent Assignment
Reel/Frame 032640/0856

Change of Address of Assignee

Recorded: 2014-04-08 Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2013-01-01
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Polishing Agent, Concentrated One-Pack Type Polishing Agent, Two-Pack Type Polishing Agent and Method for Polishing Substrate
Patent: 8,728,341 →
Application: 13/388,169 →
Publication: US 2012/0129346
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 31, 2012
From: RYUZAKI, DAISUKE; NARITA, TAKENORI; HOSHI, YOUSUKE; IWANO, TOMOHIRO
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 027626/0174 →
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →