Patent Assignment
Reel/Frame 033113/0500
Assignment of Assignor's Interest
Recorded: 2014-06-16
Pages: 3
Assignor
HAN, QIUHUA
Executed: 2014-05-27
Assignee
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANG JIANG ROAD, PUDONG NEW AREA, SHANGHAI, 201203, CHINA
Covered Property
(1)
Method of Forming High K Metal Gate