IP Library › Assignment 033440/0425
Patent Assignment
Reel/Frame 033440/0425

Assignment of Assignor's Interest

Recorded: 2014-07-31 Pages: 2
Assignors
ISHIMARU, MASATO
Executed: 2014-06-23
ABE, TAKAHIRO
Executed: 2014-06-23
SUYAMA, MAKOTO
Executed: 2014-06-23
SHIMADA, TAKESHI
Executed: 2014-06-23
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Etching Method
Patent: 9,449,842 →
Application: 14/447,615 →
Publication: US 2015/0194315
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →