IP Library Assignment 033924/0369
Patent Assignment
Reel/Frame 033924/0369

Assignment of Assignor's Interest

Recorded: 2014-10-09 Pages: 3
Assignors
AKUTSU, TOSHIAKI
Executed: 2014-08-27
MINAMI, HISATAKA
Executed: 2014-08-28
IWANO, TOMOHIRO
Executed: 2014-08-28
FUJISAKI, KOJI
Executed: 2014-09-04
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Polishing Agent, Polishing Agent Set, and Substrate Polishing Method
Application: 14/379,954 →
Publication: US 2015/0017806
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →