Patent Assignment
Reel/Frame 035124/0624
Change of Address
Recorded: 2015-03-04
Pages: 2
Assignor
HITACHI CHEMICAL CO., LTD.
Executed: 2015-03-04
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Method for Producing Abrasive Grains, Method for Producing Slurry, and Method for Producing Polishing Liquid
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 6, 2012
From: IWANO, TOMOHIRO; MINAMI, HISATAKA; AKIMOTO, HIROTAKA
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 028907/0510 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →