Patent Assignment
Reel/Frame 035418/0284
Assignment of Assignor's Interest
Recorded: 2015-04-15
Pages: 3
Assignor
HWANG, JEONG MO
Executed: 2006-12-20
Assignee
CYPRESS SEMICONDUCTOR CORPORATION
198 CHAMPION COURT, SAN JOSE, CALIFORNIA, 95134
Covered Property
(1)
Simultaneous Formation of a Top Oxide Layer in a Silicon-Oxide-Nitride-Oxide-Silicon (Sonos) Transistor and a Gate Oxide in a Metal Oxide Semiconductor (Mos)
Patent:
9,583,501 →
Application:
14/599,157 →
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Security Interest
Mar 21, 2015
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 035240/0429 →
Assignment of Assignor's Interest
Mar 29, 2017
From: CYPRESS SEMICONDUCTOR CORPORATION
To: MONTEREY RESEARCH, LLC
Reel/Frame 042108/0880 →
Release of Security Interest
Jun 12, 2017
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: CYPRESS SEMICONDUCTOR CORPORATION
Reel/Frame 042769/0227 →
Corrective Assignment to Correct the 8647899 Previously Recorded on Reel 035240 Frame 0429. Assignor(S) Hereby Confirms the Security Interst.
Nov 3, 2020
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 058002/0470 →