Patent Assignment
Reel/Frame 036971/0959
Assignment of Assignor's Interest
Recorded: 2015-11-05
Pages: 3
Assignor
NAKAMURA, MASAHIRO
Executed: 2015-10-01
Assignee
ZEON CORPORATION
1-6-2 MARUNOUCHI, CHIYODA-KU, TOKYO, 100-8246, JAPAN
Covered Property
(1)
Low Energy Etch Process for Nitrogen-Containing Dielectric Layer
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Oct 27, 2015
From: BRINK, MARKUS; BRUCE, ROBERT L.; ENGELMANN, SEBASTIAN U.; FULLER, NICHOLAS C.M.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 036893/0438 →
Corrective Assignment to Correct the Name of the Assignee Previously Recorded on Reel 036893 Frame 0438. Assignor(S) Hereby Confirms the Assignment.
Nov 5, 2015
From: BRINK, MARKUS; BRUCE, ROBERT L.; ENGELMANN, SEBASTIAN U.; FULLER, NICHOLAS C.M.
To: GLOBALFOUNDRIES INC.
Reel/Frame 037055/0244 →
Security Agreement
Nov 29, 2018
From: GLOBALFOUNDRIES INC.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 049490/0001 →
Release of Security Interest
Nov 20, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES INC.
Reel/Frame 054636/0001 →
Release of Security Interest
May 12, 2021
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES U.S. INC.
Reel/Frame 056987/0001 →