Patent Assignment
Reel/Frame 037347/0322
Assignment of Assignor's Interest
Recorded: 2015-12-22
Pages: 6
Assignors
SASAHARA, NAOKI
Executed: 2015-12-14
MUKAI, IKUO
Executed: 2015-12-15
SATO, MAYUMI
Executed: 2015-12-15
SERI, YASUHIRO
Executed: 2015-12-15
ABE, KOJI
Executed: 2015-12-15
KIRYU, MANAMI
Executed: 2015-12-15
Assignee
HITACHI CHEMICAL COMPANY, LTD
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Photosensitive Element, Photosensitive Element Roll, Method for Producing Resist Pattern, and Electronic Component
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →