Patent Assignment
Reel/Frame 037383/0195
Assignment of Assignor's Interest
Recorded: 2015-12-30
Pages: 2
Assignors
TAUCHI, SUSUMU
Executed: 2015-12-04
UEMURA, TAKASHI
Executed: 2015-12-04
SATO, KOHEI
Executed: 2015-12-03
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Lower Chamber for a Plasma Processing Apparatus
Patent:
802,545 →
Application:
29/544,071 →
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.