IP Library › Assignment 037440/0147
Patent Assignment
Reel/Frame 037440/0147

Assignment of Assignor's Interest

Recorded: 2016-01-08 Pages: 5
Assignors
DE, HO WEI
Executed: 2012-02-10
LU, KUEI-LIANG
Executed: 2012-02-10
SHIEH, MING-FENG
Executed: 2012-02-10
CHANG, CHING-YU
Executed: 2012-02-10
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Cut-Mask Patterning Process for FIN-Like Field Effect Transistor (FINFET) Device
Patent: 9,904,163 →
Application: 14/991,233 →
Publication: US 2016/0124300
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Assignment to Correct the 1ST Inventor Name Previously Recorded at Reel: 037440 Frame: 0147. Assignor(S) Hereby Confirms the Assignment. Oct 10, 2017
From: HO, WEI-DE; LU, KUEI-LIANG; SHIEH, MING-FENG; CHANG, CHING-YU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 044173/0001 →