Patent Assignment
Reel/Frame 044173/0001
Corrective Assignment to Correct the 1ST Inventor Name Previously Recorded at Reel: 037440 Frame: 0147. Assignor(S) Hereby Confirms the Assignment.
Recorded: 2017-10-10
Pages: 10
Assignors
HO, WEI-DE
Executed: 2017-10-03
LU, KUEI-LIANG
Executed: 2012-02-10
SHIEH, MING-FENG
Executed: 2012-02-10
CHANG, CHING-YU
Executed: 2017-02-10
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property
(1)
Cut-Mask Patterning Process for FIN-Like Field Effect Transistor (FINFET) Device
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.