IP Library Assignment 037890/0671
Patent Assignment
Reel/Frame 037890/0671

Assignment of Assignor's Interest

Recorded: 2016-03-04 Pages: 2
Assignors
FUKUCHI, KOUSUKE
Executed: 2015-12-28
NAKAMOTO, SHIGERU
Executed: 2015-12-28
USUI, TATEHITO
Executed: 2016-01-05
INOUE, SATOMI
Executed: 2015-12-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 9,805,940 →
Application: 15/060,822 →
Publication: US 2016/0351405
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →