Patent Assignment
Reel/Frame 037988/0334
Assignment of Assignor's Interest
Recorded: 2016-03-15
Pages: 3
Assignor
SATO, NOBUYOSHI
Executed: 2016-03-07
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Method for Processing Substrate Including Forming a Film on a Silicon-Containing Surface of the Substrate to Prevent Resist from Extruding from the Substrate During an Imprinting Process
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043027/0072 →
Corrective Assignment to Correct the Assignee Postal Code Previously Recorded on Reel 043027 Frame 0072. Assignor(S) Hereby Confirms the Assignment.
Sep 1, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043747/0273 →
Merger
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address
Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →