IP Library Assignment 038054/0521
Patent Assignment
Reel/Frame 038054/0521

Assignment of Assignor's Interest

Recorded: 2016-03-21 Pages: 4
Assignors
CHOU, ANTHONY I.
Executed: 2014-11-20
KUMAR, ARVIND
Executed: 2014-11-20
LIN, CHUNG-HSUN
Executed: 2014-11-24
NARASIMHA, SHREESH
Executed: 2014-11-21
ORTOLLAND, CLAUDE
Executed: 2014-11-21
SHAW, JONATHAN T.
Executed: 2014-11-20
Assignee
INTERNATIONAL BUSINESS MACHINES CORPORATION
NEW ORCHARD ROAD, ARMONK, NEW YORK, 10504
Covered Property (1)
Asymmetric High-K Dielectric for Reducing Gate Induced Drain Leakage
Patent: 9,721,843 →
Application: 15/076,012 →
Publication: US 2016/0203987
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 6, 2020
From: INTERNATIONAL BUSINESS MACHINES CORPORATION
To: TESSERA, INC.
Reel/Frame 051489/0557 →
Security Interest Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
Change of Name Nov 21, 2025
From: TESSERA, INC.
To: TESSERA LLC
Reel/Frame 073658/0439 →
Change of Name Nov 21, 2025
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 073658/0823 →