Patent Assignment
Reel/Frame 038455/0121
Assignment of Assignor's Interest
Recorded: 2016-05-04
Pages: 2
Assignors
IWASHITA, KENICHI
Executed: 2016-04-07
KATO, TETSUYA
Executed: 2016-04-07
EBIHARA, MASAHIKO
Executed: 2016-04-07
Assignee
HITACHI CHEMICAL COMPANY, LTD
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Photosensitive Resin Composition, Photosensitive Element, Semiconductor Device and Method for Forming Resist Pattern
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →