Assignment of Assignor's Interest

Recorded: 2016-08-03 Pages: 3

Assignors

OTAKE, ATSUSHI

Executed: 2014-02-26

KURODA, AKIRA

Executed: 2014-03-14

Assignee

EKC TECHNOLOGY

CHESTNUT RUN PLAZA, 974 CENTRE ROAD, P.O. BOX 2915, WILMINGTON, DELAWARE, 19805

Covered Property (1)

Cleaning Composition and Method for Cleaning a Semiconductor Device Substrate After Chemical Mechanical Polishing

Patent: 9,481,855 →

Application: 14/026,924 →

Publication: US 2014/0076365

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.