IP Library › Assignment 039683/0280
Patent Assignment
Reel/Frame 039683/0280

Assignment of Assignor's Interest

Recorded: 2016-09-09 Pages: 2
Assignors
SHIINA, MASAYUKI
Executed: 2016-07-25
YASUI, NAOKI
Executed: 2016-07-25
ONO, TETSUO
Executed: 2016-07-31
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/260,512 →
Publication: US 2017/0092468
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →