IP Library Assignment 039725/0334
Patent Assignment
Reel/Frame 039725/0334

Change of Address

Recorded: 2016-08-18 Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2013-01-01
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Copper Metal Film, Method for Producing Same, Copper Metal Pattern, Conductive Wiring Line Using the Copper Metal Pattern, Copper Metal Bump, Heat Conduction Path, Bonding Material, and Liquid Composition
Patent: 9,457,406 →
Application: 13/496,550 →
Publication: US 2012/0175147
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 16, 2012
From: NAKAKO, HIDEO; YAMAMOTO, KAZUNORI; KUMASHIRO, YASUSHI; YOKOSAWA, SHUNYA
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 027875/0570 →
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →