Patent Assignment
Reel/Frame 039800/0648
Assignment of Assignor's Interest
Recorded: 2016-09-20
Pages: 4
Assignor
LI, YUZHU
Executed: 2016-09-18
Assignee
CHANGZHOU ZHONGMIN SEMI-TECH CO. LTD.
1668 JINTAN HUACHENG RD., INTER. INDUSTRIAL PARK, CHANGZHOU, JIANGSU, 213200, CHINA
Covered Properties
(7)
Insulated Gate Bipolar Device
Method of Forming a Trench in a Semiconductor Device
Semiconductor Device
Insulated Gate Bipolar Device
Application:
62/112,265 →
Method of Forming a Trench in a Semiconductor Device
Application:
62/126,937 →
Semiconductor Device
Application:
62/126,961 →
Semiconductor Device
Application:
62/148,921 →