Patent Assignment
Reel/Frame 040455/0382
Assignment of Assignor's Interest
Recorded: 2016-11-29
Pages: 6
Assignors
YOSHIKAWA, SHIGERU
Executed: 2016-10-19
OOTA, MUNEHIRO
Executed: 2016-10-19
TANAKA, TAKAAKI
Executed: 2016-10-20
SHINODA, TAKASHI
Executed: 2016-10-14
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Polishing Liquid for Cmp, Polishing Liquid Set for Cmp, and Polishing Method
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →