Patent Assignment
Reel/Frame 040857/0807
Assignment of Assignor's Interest
Recorded: 2017-01-05
Pages: 4
Assignees
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANGJIANG ROAD, PUDONG NEW AREA, SHANGHAI, 201203, CHINA
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
NO.18, WEN CHANG RD., ECONOMIC-TECHNOLOGICAL DEVELOPMENT AREA, DAXING DISTRICT, BEIJING, 100716, CHINA
Covered Property
(1)
Method of Fabricating a Semiconductor Structure by Asymmetric Oxidation of Fin Material Formed under Gate Stack