Patent Assignment
Reel/Frame 041124/0705
Assignment of Assignor's Interest
Recorded: 2017-01-30
Pages: 3
Assignors
AKITA, MASATO
Executed: 2016-12-26
UI, AKIO
Executed: 2016-12-26
SANADA, YASUSHI
Executed: 2016-12-26
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
Covered Property
(1)
Plasma Induced Flow Electrode Structure, Plasma Induced Flow Generation Device, and Method of Manufacturing Plasma Induced Flow Electrode Structure