Patent Assignment
Reel/Frame 041165/0326
Assignment of Assignor's Interest
Recorded: 2017-02-03
Pages: 3
Assignors
MACHII, YOUICHI
Executed: 2012-10-16
YOSHIDA, MASATO
Executed: 2012-10-19
NOJIRI, TAKESHI
Executed: 2012-10-24
OKANIWA, KAORU
Executed: 2012-11-02
IWAMURO, MITSUNORI
Executed: 2012-10-24
ADACHI, SHUICHIRO
Executed: 2012-10-16
SATO, TETSUYA
Executed: 2012-10-16
KIZAWA, KEIKO
Executed: 2012-10-17
Assignee
HITACHI CHEMICAL CO., LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Composition for Forming N-Type Diffusion Layer, Method of Forming N-Type Diffusion Layer, and Method of Producing Photovoltaic Cell
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →