IP Library Assignment 041437/0898
Patent Assignment
Reel/Frame 041437/0898

Assignment of Assignor's Interest

Recorded: 2017-03-02 Pages: 2
Assignors
SHIRAISHI, DAISUKE
Executed: 2016-12-26
KAGOSHIMA, AKIRA
Executed: 2016-12-26
NAGATANI, YUJI
Executed: 2016-12-26
INOUE, SATOMI
Executed: 2016-12-26
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/437,026 →
Publication: US 2018/0068909
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →