IP Library › Assignment 041765/0336
Patent Assignment
Reel/Frame 041765/0336

Assignment of Assignor's Interest

Recorded: 2017-03-28 Pages: 3
Assignors
OIE, TOSHIYUKI
Executed: 2016-12-13
SHIMADA, KENJI
Executed: 2016-12-13
Assignee
MITSUBISHI GAS CHEMICAL COMPANY, INC.
5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8324, JAPAN
Covered Property (1)
Semiconductor Element Cleaning Solution That Suppresses Damage to Cobalt, and Method for Cleaning Semiconductor Element Using Same
Application: 15/514,917 →
Publication: US 2017/0240850