IP Library › Assignment 041821/0009
Patent Assignment
Reel/Frame 041821/0009

Assignment of Assignor's Interest

Recorded: 2017-04-03 Pages: 4
Assignors
WEIS, ROLF
Executed: 2017-01-30
BARTELS, MARTIN
Executed: 2017-01-30
LEMKE, MARKO
Executed: 2017-01-30
TEGEN, STEFAN
Executed: 2017-01-30
Assignee
INFINEON TECHNOLOGIES DRESDEN GMBH
KOENIGSBRUECKER STR. 180, DRESDEN, 01099, GERMANY
Covered Property (1)
Method for Manufacturing a Semiconductor Device Having Silicide Layers
Patent: 9,941,375 →
Application: 15/417,436 →
Publication: US 2017/0222010
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 12, 2024
From: INFINEON TECHNOLOGIES DRESDEN GMBH
To: INFINEON TECHNOLOGIES DRESDEN GMBH & CO. KG
Reel/Frame 067699/0648 →