IP Library Assignment 042410/0875
Patent Assignment
Reel/Frame 042410/0875

Assignment of Assignor's Interest

Recorded: 2017-05-17 Pages: 4
Assignors
TOMURA, MAJU
Executed: 2017-05-09
KATSUNUMA, TAKAYUKI
Executed: 2017-04-27
HONDA, MASANOBU
Executed: 2017-04-27
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Selective Plasma Etching Method of a First Region Containing a Silicon Atom and an Oxygen Atom
Application: 15/527,360 →
Publication: US 2017/0323825