IP Library Assignment 042680/0579
Patent Assignment
Reel/Frame 042680/0579

Assignment of Assignor's Interest

Recorded: 2017-06-12 Pages: 4
Assignor
PLATZGUMMER, ELMAR
Executed: 2017-05-30
Assignee
IMS NANOFABRICATION AG
SCHREYGASSE 3, VIENNA, 1020, AUSTRIA
Covered Property (1)
Method for Compensating Pattern Placement Errors Caused by Variation of Pattern Exposure Density in a Multi-Beam Writer
Application: 15/620,599 →
Publication: US 2017/0357153
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Dec 21, 2017
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 046070/0085 →
Assignment of Assignor's Interest Jun 13, 2024
From: IMS NANOFABRICATION GMBH
To: IMS NANOFABRICATION GMBH
Reel/Frame 067724/0838 →