Patent Assignment
Reel/Frame 067724/0838
Assignment of Assignor's Interest
Recorded: 2024-06-13
Pages: 26
Assignor
IMS NANOFABRICATION GMBH
Executed: 2021-10-05
Assignee
IMS NANOFABRICATION GMBH
WOLFHOLZGASSE 20-24, BRUNN AM GEBIRGE, 2345, AUSTRIA
Covered Properties
(48)
Apparatus for Enhancing the Lifetime of Stencil Masks
Ion Irradiation of a Target at Very High and Very Low Kinetic Ion Energies
Particle-Optic Electrostatic Lens
Charged-Particle Multi-Beam Exposure Apparatus
Pattern-Definition Device for Maskless Particle-Beam Exposure Apparatus
Compensation of Magnetic Fields
Advanced Pattern Definition for Particle-Beam Processing
Particle-Optical Projection System
Pattern Lock System for Particle-Beam Exposure Apparatus
Charged-Particle Exposure Apparatus with Electrostatic Zone Plate
Charged-Particle Exposure Apparatus
Particle-Beam Apparatus with Improved Wien-Type Filter
Charged-Particle Exposure Apparatus
Multi-Beam Deflector Array Device for Maskless Particle-Beam Processing
Method for Maskless Particle-Beam Exposure
Pattern Definition Device Having Distinct Counter-Electrode Array Plate
Multi-Beam Source
Particle-Beam Exposure Apparatus with Overall-Modulation of a Patterned Beam
Compensation of Dose Inhomogeneity and Image Distortion
Constant Current Multi-Beam Patterning
Method for Maskless Particle-Beam Exposure
Method for Producing a Multi-Beam Deflector Array Device Having Electrodes
Global Point Spreading Function in Multi-Beam Patterning
Method for Maskless Particle-Beam Exposure
Multi-Beam Deflector Array Means with Bonded Electrodes
Pattern Definition Device with Multiple Multibeam Array
Method for Multi-Beam Exposure on a Target
High-Voltage Insulation Device for Charged-Particle Optical Apparatus
Pattern Definition Device Having Multiple Blanking Arrays
Method for Charged-Particle Multi-Beam Exposure
Compensation of Defective Beamlets in a Charged-Particle Multi-Beam Exposure Tool
Multi-Beam Tool for Cutting Patterns
Compensation of Dose Inhomogeneity Using Overlapping Exposure Spots
Compensation of Imaging Deviations in a Particle-Beam Writer Using a Convolution Kernel
Customizing a Particle-Beam Writer Using a Convolution Kernel
Correction of Short-Range Dislocations in a Multi-Beam Writer
Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension
Bi-Directional Double-Pass Multi-Beam Writing
Multi-Beam Writing Using Inclined Exposure Stripes
Method for Compensating Pattern Placement Errors Caused by Variation of Pattern Exposure Density in a Multi-Beam Writer
Advanced Dose-Level Quantization for Multibeam-Writers
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed in a Multi Beam Writing Apparatus
Method for Irradiating a Target Using Restricted Placement Grids
Non-linear Dose- and Blur-Dependent Edge Placement Correction
Charged-Particle Source and Method for Cleaning a Charged-Particle Source Using Back-Sputtering
Adapting the Duration of Exposure Slots in Multi-Beam Writers
Correction of Blur Variation in a Multi-Beam Writer
Charged-Particle Source
Related Assignments
(22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
May 6, 2003
From: PLATZGUMMER, ELMAR; LOSCHNER, HANS; STENGL, GERHARD
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 014029/0480 →
Assignment of Assignor's Interest
Jul 7, 2004
From: PLATZGUMMER, ELMAR; STENGEL, GERHARD; LOESCHNER, HANS
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 015558/0348 →
Assignment of Assignor's Interest
Oct 27, 2004
From: LAMMER-PACHLINGER, WOLFGANG; LAMMER, GERTRAUD; CHALUPKA, ALFRED
To: IMS NANOFABRICATION GMBH
Reel/Frame 015939/0937 →
Assignment of Assignor's Interest
Dec 10, 2004
From: STENGL, GERHARD; BUSCHBECK, HERBERT; LAMMER, GERTRAUD
To: IMS NANOFABRICATION GMBH
Reel/Frame 016060/0967 →
Assignment of Assignor's Interest
Jan 15, 2005
From: STENGL, GERHARD; PLATZGUMMER, ELMAR; LOSCHNER, HANS
To: IMS NANOFABRICATION GMBH
Reel/Frame 016154/0072 →
Assignment of Assignor's Interest
Mar 2, 2005
From: BUSCHBECK, HERBERT; STENGL, GERHARD
To: IMS NANOFABRICATION GMBH
Reel/Frame 016357/0966 →
Assignment of Assignor's Interest
Mar 8, 2005
From: FORMAN, GEORGE H; SUERMONDT, HENRI JACQUES; STINGER, JAMES R
To: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Reel/Frame 015853/0747 →
Assignment of Assignor's Interest
Jun 27, 2005
From: PLATZGUMMER, ELMAR; CERNUSCA, STEFAN
To: IMS NANOFABRICATION GMBH
Reel/Frame 016716/0500 →
Assignment of Assignor's Interest
Aug 13, 2007
From: PLATZGUMMER, ELMAR; CEMUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 019687/0936 →
Assignment of Assignor's Interest
Aug 21, 2007
From: PLATZGAMMER, ELMAR; CERNUSCA, STEFAN; STENGL, GERHARG
To: IMS NANOFABRICATION AG
Reel/Frame 019722/0796 →
Assignment of Assignor's Interest
Oct 1, 2007
From: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
To: IMS NANOFABRICATION AG
Reel/Frame 019899/0339 →
Assignment of Assignor's Interest
Oct 30, 2007
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020089/0085 →
Assignment of Assignor's Interest
Mar 10, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020621/0110 →
Assignment of Assignor's Interest
Apr 28, 2008
From: PLATZGUMMER, ELMAR; LOSCHNER, HANS; KVASNICA, SAMUEL; SPRINGER, REINHARD
To: IMS NANOFABRICATION AG; INSTITUT FUR MIKROELEKTRONIK
Reel/Frame 020865/0052 →
Assignment of Assignor's Interest
May 9, 2008
From: FRAGNER, HEINRICH; PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020923/0737 →
Assignment of Assignor's Interest
Jul 24, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 021284/0975 →
Assignment of Assignor's Interest
Jul 24, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 021288/0377 →
Corrective Assignment to Correct the Second Inventor's Surname. It Should Read Stefan Cernusca Previously Recorded on Reel 019687 Frame 0936. Assignor(S) Hereby Confirms the Assignee.
Jul 31, 2008
From: PLATZGUMMER, ELMAR; CERNUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 021321/0678 →
Assignment of Assignor's Interest
Nov 26, 2008
From: STENGL, GERHARD; BUSCHBECK, HERBERT; NOWAK, ROBERT
To: IMS NANOFABRICATION AG
Reel/Frame 021894/0107 →
License
Mar 10, 2010
From: IMS NANOFABRICATION AG
To: INTEL CORPORATION
Reel/Frame 024055/0092 →
Change of Name
Dec 21, 2017
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 046070/0085 →
Change of Name
Jan 29, 2018
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 045185/0484 →