IP Library Assignment 024055/0092
Patent Assignment
Reel/Frame 024055/0092

License

Recorded: 2010-03-10 Pages: 9
Assignor
IMS NANOFABRICATION AG
Executed: 2010-03-03
Assignee
INTEL CORPORATION
2200 MISSION COLLEGE BLVD., SANTA CLARA, CALIFORNIA, 95052
Covered Properties (23)
Arrangement for Masked Beam Lithography by Means of Electrically Charged Particles
Patent: 5,742,062 →
Application: 08/598,081 →
Particle Beam, in Particular Ionic Optic Imaging System
Patent: 5,801,388 →
Application: 08/669,481 →
Arrangement for Shadow-Casting Lithography
Patent: 5,874,739 →
Application: 08/914,070 →
Particle-Optical Imaging System for Lithography Purposes
Patent: 6,326,632 →
Application: 09/417,633 →
Pattern Lock System
Patent: 6,661,015 →
Application: 09/950,140 →
Publication: US 2002/0033457
Maskless Particle-Beam System for Exposing a Pattern on a Substrate
Patent: 6,768,125 →
Application: 10/337,903 →
Publication: US 2003/0155534
Apparatus for Enhancing the Lifetime of Stencil Masks
Patent: 6,858,118 →
Application: 10/395,572 →
Publication: US 2004/0188243
Ion Irradiation of a Target at Very High and Very Low Kinetic Ion Energies
Patent: 6,909,103 →
Application: 10/886,463 →
Publication: US 2005/0012052
Particle-Optic Electrostatic Lens
Patent: 7,199,373 →
Application: 10/951,087 →
Publication: US 2005/0072933
Charged-Particle Multi-Beam Exposure Apparatus
Patent: 7,214,951 →
Application: 10/969,493 →
Publication: US 2005/0104013
Pattern-Definition Device for Maskless Particle-Beam Exposure Apparatus
Patent: 7,084,411 →
Application: 10/974,276 →
Publication: US 2005/0087701
Compensation of Magnetic Fields
Patent: 7,436,120 →
Application: 11/070,439 →
Publication: US 2005/0195551
Advanced Pattern Definition for Particle-Beam Processing
Patent: 7,276,714 →
Application: 11/119,025 →
Publication: US 2005/0242302
Particle-Optical Projection System
Patent: 7,388,217 →
Application: 11/700,468 →
Publication: US 2007/0125956
Pattern Lock System for Particle-Beam Exposure Apparatus
Patent: 7,772,574 →
Application: 11/719,320 →
Publication: US 2009/0146082
Charged-Particle Exposure Apparatus with Electrostatic Zone Plate
Patent: 8,304,749 →
Application: 11/816,059 →
Publication: US 2008/0230711
Charged-Particle Exposure Apparatus
Patent: 7,737,422 →
Application: 11/816,353 →
Publication: US 2008/0258084
Particle-Beam Apparatus with Improved Wien-Type Filter
Patent: 7,763,851 →
Application: 11/951,543 →
Publication: US 2008/0149846
Charged-Particle Exposure Apparatus
Patent: 7,598,499 →
Application: 11/978,661 →
Publication: US 2008/0099693
Method for Maskless Particle-Beam Exposure
Patent: 7,777,201 →
Application: 12/051,087 →
Publication: US 2008/0237460
Pattern Definition Device Having Distinct Counter-Electrode Array Plate
Patent: 7,714,298 →
Application: 12/120,130 →
Publication: US 2008/0283767
Multi-Beam Source
Patent: 8,183,543 →
Application: 12/178,153 →
Publication: US 2009/0026389
Particle-Beam Exposure Apparatus with Overall-Modulation of a Patterned Beam
Patent: 7,781,748 →
Application: 12/294,262 →
Publication: US 2009/0200495
Related Assignments (22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 29, 1996
From: STENGL, GERHARD; CHALUPKA, ALFRED; VONACH, HERBERT
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 008198/0787 →
Assignment of Assignor's Interest Aug 18, 1997
From: BUSCHBECK, HERBERT; CHALUPKA, ALFRED; LOESCHNER, HANS; STENGL, GERHARD
To: IMS-IONEN MIKROFABRIKATIONS SYSTEMS GMBH
Reel/Frame 008682/0558 →
Assignment of Assignor's Interest Oct 14, 1999
From: BUSCHBECK, HERBERT; CHALUPKA, ALFRED; LAMMER, GERTRAUD; LOESCHNER, HANS
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 010344/0046 →
Assignment of Assignor's Interest Sep 10, 2001
From: CHALUPKA, ALFRED; STENGL, GERHARD; LOSCHNER, HANS; NOWAK, ROBERT
To: IMS-IONEN MIKROFABRIKATIONS SYSETMS GMBH
Reel/Frame 012164/0389 →
Assignment of Assignor's Interest Apr 30, 2003
From: PLATZGUMMER, ELMAR; LOESCHNER, HANS; STENGL, GERHARD; VONACH, HERBERT
To: IMS NANOFABRICATION GMBH
Reel/Frame 014008/0697 →
Assignment of Assignor's Interest May 6, 2003
From: PLATZGUMMER, ELMAR; LOSCHNER, HANS; STENGL, GERHARD
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 014029/0480 →
Assignment of Assignor's Interest Jul 7, 2004
From: PLATZGUMMER, ELMAR; STENGEL, GERHARD; LOESCHNER, HANS
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 015558/0348 →
Assignment of Assignor's Interest Oct 27, 2004
From: LAMMER-PACHLINGER, WOLFGANG; LAMMER, GERTRAUD; CHALUPKA, ALFRED
To: IMS NANOFABRICATION GMBH
Reel/Frame 015939/0937 →
Assignment of Assignor's Interest Dec 10, 2004
From: STENGL, GERHARD; BUSCHBECK, HERBERT; LAMMER, GERTRAUD
To: IMS NANOFABRICATION GMBH
Reel/Frame 016060/0967 →
Assignment of Assignor's Interest Jan 15, 2005
From: STENGL, GERHARD; PLATZGUMMER, ELMAR; LOSCHNER, HANS
To: IMS NANOFABRICATION GMBH
Reel/Frame 016154/0072 →
Assignment of Assignor's Interest Mar 2, 2005
From: BUSCHBECK, HERBERT; STENGL, GERHARD
To: IMS NANOFABRICATION GMBH
Reel/Frame 016357/0966 →
Assignment of Assignor's Interest Mar 8, 2005
From: FORMAN, GEORGE H; SUERMONDT, HENRI JACQUES; STINGER, JAMES R
To: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Reel/Frame 015853/0747 →
Assignment of Assignor's Interest Jun 27, 2005
From: PLATZGUMMER, ELMAR; CERNUSCA, STEFAN
To: IMS NANOFABRICATION GMBH
Reel/Frame 016716/0500 →
Assignment of Assignor's Interest Aug 13, 2007
From: PLATZGUMMER, ELMAR; CEMUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 019687/0936 →
Assignment of Assignor's Interest Aug 21, 2007
From: PLATZGAMMER, ELMAR; CERNUSCA, STEFAN; STENGL, GERHARG
To: IMS NANOFABRICATION AG
Reel/Frame 019722/0796 →
Assignment of Assignor's Interest Oct 1, 2007
From: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
To: IMS NANOFABRICATION AG
Reel/Frame 019899/0339 →
Assignment of Assignor's Interest Mar 10, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020621/0110 →
Corrective Assignment to Correct the Second Inventor's Surname. It Should Read Stefan Cernusca Previously Recorded on Reel 019687 Frame 0936. Assignor(S) Hereby Confirms the Assignee. Jul 31, 2008
From: PLATZGUMMER, ELMAR; CERNUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 021321/0678 →
Assignment of Assignor's Interest Nov 26, 2008
From: STENGL, GERHARD; BUSCHBECK, HERBERT; NOWAK, ROBERT
To: IMS NANOFABRICATION AG
Reel/Frame 021894/0107 →
Change of Name Dec 21, 2017
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 046070/0085 →
Change of Name Jan 29, 2018
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 045185/0484 →
Assignment of Assignor's Interest Jun 13, 2024
From: IMS NANOFABRICATION GMBH
To: IMS NANOFABRICATION GMBH
Reel/Frame 067724/0838 →